
The construction ceremony of the silicon carbide-based semiconductor core components factory began
Shenyang Starlight Advanced Ceramics Embarks on Semiconductor Ecosystem Expansion with New Production Facilities
Shenyang Starlight Advanced Ceramics Co., Ltd., China's pioneering advanced silicon carbide kiln furniture manufacturer established in 1995 through a landmark Sino-German joint venture with Fine Technical Ceramics GmbH, today announced a strategic leap into semiconductor supply chain integration. The company commenced construction of its semiconductor core component production facility and CVD (Chemical Vapor Deposition) workshop on June 10, 2025, marking a transformative phase in its three-decade journey of technological innovation.
Strategic Expansion Overview
This $350 million investment project reinforces Shenyang Starlight's commitment to vertical integration in semiconductor manufacturing:
Core Component Facility: Dedicated to mass-producing ultra-high-purity silicon carbide parts for wafer handling, thermal management, and process chambers.
CVD Workshop: Specializing in advanced silicon carbide coatings for semiconductor equipment, including plasma-resistant and anti-corrosion layers.
Integrated R&D Center: Housing cutting-edge materials analysis laboratories and process simulation systems.
Technical Capabilities
The new facilities will leverage Shenyang Starlight's legacy strengths:
Material Expertise: 30 years of RSiC (Recrystallized silicon carbide) and NSiC (Nitride-Bonded silicon carbide) production experience
Quality Heritage: China's first ISO 9001-certified silicon carbide kiln manufacturer (2002)
Precision Engineering: Sub-0.01mm machining accuracy proven in semiconductor-grade components
Global Recognition: 35% export share across 20+ countries (per 2024 customs data)
Facility Specifications
Semiconductor Component Plant
Cleanroom Standards: ISO Class 5-7 environments
Production Capacity: 50,000+ precision parts annually
Key Products:
12-inch wafer carriers (450mm OD)
CVD/CVI process tubes
Edge ring components for etching systems
CVD Coating Workshop
Deposition Technologies: PECVD, LPCVD, and ALD capabilities
Coating Performance:
≤0.05μm surface roughness
99.999% purity coatings
10,000+ cycle durability
Industry Impact
This expansion addresses critical supply chain needs:
Localization: Reducing reliance on imported semiconductor components by 40%
Technical Breakthroughs: Developing proprietary high-entropy silicon carbide coatings
Sustainability: Implementing closed-loop material recycling systems
R&D Collaboration
The project builds on existing partnerships with:
Tsinghua University: Joint development of AI-driven process optimization systems
Northeastern University: Advanced thermal stress modeling for large-format components
CAS Institutes: Next-generation ceramic matrix composites
Project Timeline
June 2025: Foundation completion
Q4 2025: Equipment installation
Q2 2026: Pilot production
2027: Full capacity operation
Leadership Perspective
"This expansion represents our evolution from kiln specialist to semiconductor solutions architect," stated Mr. Liu Changchun, Chairman. "By integrating CVD capabilities with precision manufacturing, we're positioned to deliver complete subsystem solutions for 3nm node fabs."
Market Positioning
The initiative aligns with China's semiconductor self-sufficiency goals, targeting:
25% market share in domestic silicon carbide components by 2028
50% reduction in lead times for advanced silicon carbide coatings
30% cost advantage over imported alternatives
Sustainability Commitments
Energy Efficiency: 40% reduced power consumption via waste heat recovery
Emission Control: 99.9% particulate filtration in CVD processes
Material Utilization: 95%+ yield rate through AI-optimized machining
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